Wincome Incorporation.
Particle Trap , Particle Trap Device for Array Process
Particle Trap Device for Array Process
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| Etching |
CVD |
Implantation |
What is NEW TRAPPACK
NEW TRAPPACK is Powder Trap to remove particles (reactive generates)in the exhaust gas from CVD devices of semiconductor and TFT LCD. This machine features the new coiled absorption system which removes large amount of fine particles by not harming conductance. Further the magnetic absorption effect of TRAPPACK Element results in perfect removal of powder at a low conductance loss.
Features of NEW TRAPPACK
1.Removes large amounts of powder at high performance.
2.By not harming conductance, it maintains long life. (COIL Element)
3.Removes sub-micron particles at a low conductance loss.(TRAPPACK Element)
4.Though its magnetic absorptive effect, its ability to trap powder is tremendous
5.Models available for both Vacuum side and Exhaust side of V/P
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| :: Principle of Element
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| In COIL Element and TRAPPACK Element , the
element itself has properties similar to a magnet . |
| Thus fine particles are absorbed at the surface
of Element . |
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| Combination
Type (Accurate Catch Type) |
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| Coil
Type (Considerable Quantities Catch Type) |
This is the detailed information for Particle Trap Device for Array Process, Particle Trap. The information includes model, name, description and specification for Particle Trap Device for Array Process, Particle Trap. Related Keywords : Trap, Powder Trap, Exhaust Gas Remover, Exhaust Gas Trap, Cleaner, Powder Cleaner, Powder Collector, Collector, Particle Trap
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